TY - JOUR
T1 - Accurate frequency alignment in fabrication of high-order microring-resonator filters
AU - Jie, Sun
AU - Holzwarth, Charles W.
AU - Dahlem, Marcus
AU - Hastings, Jeffrey T.
AU - Smith, Henry I.
PY - 2008/9/29
Y1 - 2008/9/29
N2 - Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.
AB - Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.
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U2 - 10.1364/OE.16.015958
DO - 10.1364/OE.16.015958
M3 - Article
C2 - 18825233
AN - SCOPUS:54749087136
VL - 16
SP - 15958
EP - 15963
IS - 20
ER -