Accurate frequency alignment in fabrication of high-order microring-resonator filters

Sun Jie, Charles W. Holzwarth, Marcus Dahlem, Jeffrey T. Hastings, Henry I. Smith

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.

Original languageEnglish
Pages (from-to)15958-15963
Number of pages6
JournalOptics Express
Issue number20
StatePublished - Sep 29 2008

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics


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