Abstract
Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.
| Original language | English |
|---|---|
| Pages (from-to) | 15958-15963 |
| Number of pages | 6 |
| Journal | Optics Express |
| Volume | 16 |
| Issue number | 20 |
| DOIs | |
| State | Published - Sep 29 2008 |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
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