Atomic-scale structural analyses of epitaxial Co/Re superlattices

Wentao Xu, Lance E. De Long, Timothy Charlton, Matthew Chisholm, David Lederman

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


High-resolution transmission electron microscopy and scanning transmission electron microscopy (STEM) have been used to investigate atomic-scale structural properties of Co/Re trilayers and superlattices grown via magnetron sputtering. The sample growth was epitaxial with the (10̄10) plane of Co and Re parallel to the (11̄20) plane of Al 2O 3, and the [001] direction of Re and Co coinciding with that of the Al 2O 3. Both low-angle and high-angle Z-contrast STEM images show a very uniform layer thickness. However, the interface roughness between the Re and Co layers monotonically increases with interface distance from the substrate. These results strongly imply that, in the epitaxial Re/Co superlattice system, interface roughness plays a more important role in the giant magnetoresistance effect than thickness fluctuations of the spacer layer. Previous anisotropic magnetoresistance measurements can be explained in terms of the observed atomic-scale structure.

Original languageEnglish
Pages (from-to)4082-4084
Number of pages3
JournalApplied Physics Letters
Issue number18
StatePublished - Nov 1 2004

Bibliographical note

Funding Information:
This work was supported by The University of Kentucky Office of Graduate Studies and Research and by NSF-EPSCoR Grant No. EPS-0083046 at both the University of Kentucky and West Virginia University. The research at Oak Ridge National Laboratory was supported by the U.S. Department of Energy under Contract No. DE-AC05-00OR22725.

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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