TY - GEN
T1 - Characterization of osmium-ruthenium coatings for porous tungsten dispenser cathodes
AU - Balk, T. John
AU - Li, Wen Chung
AU - Roberts, Scott
PY - 2008
Y1 - 2008
N2 - Dispenser cathodes serve as electron sources in numerous vacuum devices, including traveling wave tubes and cathode ray tubes. These devices find use in commercial, military and space applications, requiring a long and reliable operating lifetime, especially for spacebased operation. Semicon Associates, in Lexington, KY, leads this market, producing over 20,000 dispenser cathodes annually. The cathodes comprise several materials, including platinum group metal coatings that add significant production cost. It is not yet understood how the microstructure of these precious metal films affects cathode performance. Fundamental understanding of microstructure-property relationships in the coating could improve device performance and allow more economical use of the precious metals.
AB - Dispenser cathodes serve as electron sources in numerous vacuum devices, including traveling wave tubes and cathode ray tubes. These devices find use in commercial, military and space applications, requiring a long and reliable operating lifetime, especially for spacebased operation. Semicon Associates, in Lexington, KY, leads this market, producing over 20,000 dispenser cathodes annually. The cathodes comprise several materials, including platinum group metal coatings that add significant production cost. It is not yet understood how the microstructure of these precious metal films affects cathode performance. Fundamental understanding of microstructure-property relationships in the coating could improve device performance and allow more economical use of the precious metals.
KW - Microstructure
KW - Osmium ruthenium
KW - Thin film
UR - http://www.scopus.com/inward/record.url?scp=51349120115&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=51349120115&partnerID=8YFLogxK
U2 - 10.1109/IVELEC.2008.4556406
DO - 10.1109/IVELEC.2008.4556406
M3 - Conference contribution
AN - SCOPUS:51349120115
SN - 1424417155
SN - 9781424417155
T3 - 2008 IEEE International Vacuum Electronics Conference, IVEC with 9th IEEE International Vacuum Electron Sources Conference, IVESC
SP - 42
EP - 43
BT - 2008 IEEE International Vacuum Electronics Conference, IVEC with 9th IEEE International Vacuum Electron Sources Conference, IVESC
T2 - 2008 IEEE International Vacuum Electronics Conference, IVEC with 9th IEEE International Vacuum Electron Sources Conference, IVESC
Y2 - 22 April 2008 through 24 April 2008
ER -