Composition and work function relationship in Os-Ru-W ternary alloys

Phillip Swartzentruber, T. John Balk, Scott Roberts, Michael Effgen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Os-Ru thin films with varying concentrations of W were sputter deposited on Mo-Re substrates. The films were analyzed with XRD to investigate their crystal structures and a Kelvin Probe to investigate their work functions. A film with ∼30 at.% W yielded a work function maximum of approximately 5.15 eV.

Original languageEnglish
Title of host publication14th IEEE International Vacuum Electronics Conference, IVEC 2013 - Proceedings
DOIs
StatePublished - 2013
Event14th IEEE International Vacuum Electronics Conference, IVEC 2013 - Paris, France
Duration: May 21 2013May 23 2013

Publication series

Name14th IEEE International Vacuum Electronics Conference, IVEC 2013 - Proceedings

Conference

Conference14th IEEE International Vacuum Electronics Conference, IVEC 2013
Country/TerritoryFrance
CityParis
Period5/21/135/23/13

Keywords

  • Os-Ru
  • microstructure
  • ternary alloy
  • work function

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Composition and work function relationship in Os-Ru-W ternary alloys'. Together they form a unique fingerprint.

Cite this