TY - JOUR
T1 - Correlation between microstructure and thermionic electron emission from Os-Ru thin films on dispenser cathodes
AU - Swartzentruber, Phillip D.
AU - John Balk, Thomas
AU - Effgen, Michael P.
PY - 2014/7
Y1 - 2014/7
N2 - Osmium-ruthenium films with different microstructures were deposited onto dispenser cathodes and subjected to 1000 h of close-spaced diode testing. Tailored microstructures were achieved by applying substrate biasing during deposition, and these were evaluated with scanning electron microscopy, x-ray diffraction, and energy dispersive x-ray spectroscopy before and after close-spaced diode testing. Knee temperatures determined from the close-spaced diode test data were used to evaluate cathode performance. Cathodes with a large {10-11} Os-Ru film texture possessed comparatively low knee temperatures. Furthermore, a low knee temperature correlated with a low effective work function as calculated from the close-spaced diode data. It is proposed that the formation of strong {10-11} texture is responsible for the superior performance of the cathode with a multilayered Os-Ru coating.
AB - Osmium-ruthenium films with different microstructures were deposited onto dispenser cathodes and subjected to 1000 h of close-spaced diode testing. Tailored microstructures were achieved by applying substrate biasing during deposition, and these were evaluated with scanning electron microscopy, x-ray diffraction, and energy dispersive x-ray spectroscopy before and after close-spaced diode testing. Knee temperatures determined from the close-spaced diode test data were used to evaluate cathode performance. Cathodes with a large {10-11} Os-Ru film texture possessed comparatively low knee temperatures. Furthermore, a low knee temperature correlated with a low effective work function as calculated from the close-spaced diode data. It is proposed that the formation of strong {10-11} texture is responsible for the superior performance of the cathode with a multilayered Os-Ru coating.
UR - http://www.scopus.com/inward/record.url?scp=84901320744&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84901320744&partnerID=8YFLogxK
U2 - 10.1116/1.4876337
DO - 10.1116/1.4876337
M3 - Article
AN - SCOPUS:84901320744
SN - 0734-2101
VL - 32
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 4
M1 - 040601
ER -