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Domain wall conductivity in semiconducting hexagonal ferroelectric TbMnO3 thin films

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16 Scopus citations

Abstract

Although enhanced conductivity of ferroelectric domain boundaries has been found in BiFeO3 and Pb(Zr,Ti)O3 films as well as hexagonal rare-earth manganite single crystals, the mechanism of the domain wall conductivity is still under debate. Using conductive atomic force microscopy, we observe enhanced conductance at the electrically-neutral domain walls in semiconducting hexagonal ferroelectric TbMnO3 thin films where the structure and polarization direction are strongly constrained along the c-axis. This result indicates that domain wall conductivity in ferroelectric rare-earth manganites is not limited to charged domain walls. We show that the observed conductivity in the TbMnO3 films is governed by a single conduction mechanism, namely, the back-to-back Schottky diodes tuned by the segregation of defects.

Original languageEnglish
Article number155705
JournalNanotechnology
Volume27
Issue number15
DOIs
StatePublished - Mar 2 2016

Bibliographical note

Publisher Copyright:
© 2016 IOP Publishing Ltd.

Funding

Research at the University of Nebraska-Lincoln was supported by the US Department of Energy, Materials Sciences Division, under Award No. DE-SC0004876 (conductive atomic force microscopy characterization) and the National Science Foundation (NSF) through the Nebraska Materials Research Science and Engineering Center (MRSEC) under Grant No. DMR-1420645 (modeling). The work (sample preparation) at the University of Kentucky was supported by the NSF through Grant No. DMR-1454200, No. EPS-0814194 (the Center for Advanced Materials), and by the Kentucky Science and Engineering Foundation with the Kentucky Science and Technology Corporation through Grant Agreement No. KSEF-148-502-14-328. DJK was partly supported by IBS-R009-G1.

FundersFunder number
Kentucky Science and Engineering Foundation
U.S. Department of Energy
Division of Materials Sciences and EngineeringDE-SC0004876
Kentucky Science and Technology CorporationKSEF-148-502-14-328, IBS-R009-G1
National Science Foundation Arctic Social Science Program1454200, 1420645, 0814194
Materials Research Science and Engineering Center, Harvard UniversityDMR-1420645, DMR-1454200, EPS-0814194

    Keywords

    • back-to-back Schottky barrier
    • conductive atomic force microscopy
    • domain wall conductivity
    • ferroelectric
    • hexagonal manganite
    • semiconducting

    ASJC Scopus subject areas

    • Bioengineering
    • General Chemistry
    • General Materials Science
    • Mechanics of Materials
    • Mechanical Engineering
    • Electrical and Electronic Engineering

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