Abstract
ω-Ti films of trigonal structure are grown epitaxially on the (111) surface of α-Fe at 300 K by electron beam evaporation in UHV. The ω-Ti films are oriented with the (0001) plane parallel to the α-Fe(111) plane and the ω-Ti [21¯1¯0] direction in the α-Fe [11¯0] direction in the plane of the substrate. The second-nearest-neighbor atomic interaction is believed responsible for the formation of ω-Ti at the interface. The relatively thick ω-Ti film (40 nm) is a result of the small energy difference between ω-Ti and the competing hcp-Ti.
Original language | English |
---|---|
Pages (from-to) | 3999-4002 |
Number of pages | 4 |
Journal | Physical Review Letters |
Volume | 76 |
Issue number | 21 |
DOIs | |
State | Published - May 20 1996 |
ASJC Scopus subject areas
- General Physics and Astronomy