Abstract
The measurement of vibrational modes at the SiO2/Si interface by Fourier-transform infrared spectrometry (FT-IR) was presented. The theory was found correct for the experiments of breaking Si-H/D bonds using scanning tunneling microscope where oxide was not involved. A difference of 27cm -1 was found between the single crystal Si sample and the amorphous Si sample.
Original language | English |
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Pages (from-to) | 2151-2153 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 83 |
Issue number | 11 |
DOIs | |
State | Published - Sep 15 2003 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)