Foaming Dependence on the Interface Affinities of Surfactant-like Molecules

Surya Prakash Tiwari, Janice A. Steckel, Moushumi Sarma, Jonathan Bryant, Cameron A. Lippert, Leland R. Widger, Jesse Thompson, Kunlei Liu, Nicholas Siefert, David Hopkinson, Wei Shi

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


We have explored the relationship between physical properties and foaming behavior of 30 wt % aqueous monoethanolamine (MEA) solutions with three different surfactant-like additives. The additives included one commercial surfactant, cetyltrimethylammonium bromide (CTAB), and two CO2 capture catalysts that behave as weak surfactants. The physical properties of interest were the additives' affinity for the liquid-vapor interface and the viscosity, surface tension, and surface elasticity of the solutions. The physical properties were explored using molecular dynamics simulations as well as experiments. The additives' affinity for the liquid-vapor interface played a key role in the foaming behavior by affecting the interfacial properties (surface tension and surface elasticity) of the aqueous MEA solutions. The solution containing CTAB showed the largest surface tension depression and the largest surface elasticity and resulted in the largest amount of foaming. The two catalyst solutions had almost similar surface tensions but differed in their elasticity. The catalyst solution with higher surface elasticity showed more foaming due to higher foam stability.

Original languageEnglish
Pages (from-to)19877-19889
Number of pages13
JournalIndustrial and Engineering Chemistry Research
Issue number43
StatePublished - Oct 30 2019

Bibliographical note

Publisher Copyright:
Copyright © 2019 American Chemical Society.

ASJC Scopus subject areas

  • General Chemistry
  • General Chemical Engineering
  • Industrial and Manufacturing Engineering


Dive into the research topics of 'Foaming Dependence on the Interface Affinities of Surfactant-like Molecules'. Together they form a unique fingerprint.

Cite this