High-temperature contact potential difference measurement of surface work function using in vacuo Kelvin probe

Antonio M. Mántica; Michael J. Detisch; T. John Balk

doi:10.1016/j.vacuum.2023.112169

High-temperature contact potential difference measurement of surface work function using in vacuo Kelvin probe

Antonio M. Mántica, Michael J. Detisch, T. John Balk

Research output: Contribution to journal › Article › peer-review

Abstract

Characterization of the work function of emitting surfaces represents an important contribution to thermionic emission research today. This is because materials that exhibit lower work functions are capable of thermionically emitting higher current densities at lower operating temperatures, which ultimately means longer lifetimes for the vacuum electron devices that make use of thermionic emitters. One widely used technique to characterize a material's work function is the measurement of contact potential difference using a Kelvin probe system. When applied in the traditional mode, this technique fails to produce meaningful results in situations where a sufficiently hot sample under inspection and the cooler Kelvin probe are in thermal disequilibrium. However, as this paper will outline, the standard application of a Kelvin probe system can be amended to facilitate meaningful asymmetric contact potential difference measurements, and consequently, obtain values of work function for samples at high temperatures, including relevant operating temperatures for thermionic emitters (>1000 °C).

Original language	English
Article number	112169
Journal	Vacuum
Volume	215
DOIs	https://doi.org/10.1016/j.vacuum.2023.112169
State	Published - Sep 2023

Bibliographical note

Funding Information:
The authors thank Prof. Iain Baikie for technical guidance and discussions related to the modification of measurement techniques, including the asymmetric CPD approach, to enhance capabilities of the Kelvin probe system manufactured by his company (KP Technology Ltd.). The authors also thank Claudia Goggin and Daniel Bugaris at Engi-Mat Co., as well as Daniel Busbaher and Ruslan Chubaruk at 3M Technical Ceramics, for technical guidance, preparation of samples, and discussions related to this work. This work was financially supported by Engi-Mat Co., USA, through the Naval Sea Systems Command under Navy STTR Contract No. N00253-17-C-0014.

Publisher Copyright:
© 2023

Keywords

Cathode
Kelvin probe
M-type cathode
Thermionic emission
Vacuum electron device

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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10.1016/j.vacuum.2023.112169

Cite this

@article{4b770a5b69f047b49dbed263782c995a,

title = "High-temperature contact potential difference measurement of surface work function using in vacuo Kelvin probe",

abstract = "Characterization of the work function of emitting surfaces represents an important contribution to thermionic emission research today. This is because materials that exhibit lower work functions are capable of thermionically emitting higher current densities at lower operating temperatures, which ultimately means longer lifetimes for the vacuum electron devices that make use of thermionic emitters. One widely used technique to characterize a material's work function is the measurement of contact potential difference using a Kelvin probe system. When applied in the traditional mode, this technique fails to produce meaningful results in situations where a sufficiently hot sample under inspection and the cooler Kelvin probe are in thermal disequilibrium. However, as this paper will outline, the standard application of a Kelvin probe system can be amended to facilitate meaningful asymmetric contact potential difference measurements, and consequently, obtain values of work function for samples at high temperatures, including relevant operating temperatures for thermionic emitters (>1000 °C).",

keywords = "Cathode, Kelvin probe, M-type cathode, Thermionic emission, Vacuum electron device",

author = "M{\'a}ntica, {Antonio M.} and Detisch, {Michael J.} and Balk, {T. John}",

note = "Funding Information: The authors thank Prof. Iain Baikie for technical guidance and discussions related to the modification of measurement techniques, including the asymmetric CPD approach, to enhance capabilities of the Kelvin probe system manufactured by his company (KP Technology Ltd.). The authors also thank Claudia Goggin and Daniel Bugaris at Engi-Mat Co., as well as Daniel Busbaher and Ruslan Chubaruk at 3M Technical Ceramics, for technical guidance, preparation of samples, and discussions related to this work. This work was financially supported by Engi-Mat Co., USA, through the Naval Sea Systems Command under Navy STTR Contract No. N00253-17-C-0014. Publisher Copyright: {\textcopyright} 2023",

year = "2023",

month = sep,

doi = "10.1016/j.vacuum.2023.112169",

language = "English",

volume = "215",

}

TY - JOUR

T1 - High-temperature contact potential difference measurement of surface work function using in vacuo Kelvin probe

AU - Mántica, Antonio M.

AU - Detisch, Michael J.

AU - Balk, T. John

N1 - Funding Information: The authors thank Prof. Iain Baikie for technical guidance and discussions related to the modification of measurement techniques, including the asymmetric CPD approach, to enhance capabilities of the Kelvin probe system manufactured by his company (KP Technology Ltd.). The authors also thank Claudia Goggin and Daniel Bugaris at Engi-Mat Co., as well as Daniel Busbaher and Ruslan Chubaruk at 3M Technical Ceramics, for technical guidance, preparation of samples, and discussions related to this work. This work was financially supported by Engi-Mat Co., USA, through the Naval Sea Systems Command under Navy STTR Contract No. N00253-17-C-0014. Publisher Copyright: © 2023

PY - 2023/9

Y1 - 2023/9

N2 - Characterization of the work function of emitting surfaces represents an important contribution to thermionic emission research today. This is because materials that exhibit lower work functions are capable of thermionically emitting higher current densities at lower operating temperatures, which ultimately means longer lifetimes for the vacuum electron devices that make use of thermionic emitters. One widely used technique to characterize a material's work function is the measurement of contact potential difference using a Kelvin probe system. When applied in the traditional mode, this technique fails to produce meaningful results in situations where a sufficiently hot sample under inspection and the cooler Kelvin probe are in thermal disequilibrium. However, as this paper will outline, the standard application of a Kelvin probe system can be amended to facilitate meaningful asymmetric contact potential difference measurements, and consequently, obtain values of work function for samples at high temperatures, including relevant operating temperatures for thermionic emitters (>1000 °C).

AB - Characterization of the work function of emitting surfaces represents an important contribution to thermionic emission research today. This is because materials that exhibit lower work functions are capable of thermionically emitting higher current densities at lower operating temperatures, which ultimately means longer lifetimes for the vacuum electron devices that make use of thermionic emitters. One widely used technique to characterize a material's work function is the measurement of contact potential difference using a Kelvin probe system. When applied in the traditional mode, this technique fails to produce meaningful results in situations where a sufficiently hot sample under inspection and the cooler Kelvin probe are in thermal disequilibrium. However, as this paper will outline, the standard application of a Kelvin probe system can be amended to facilitate meaningful asymmetric contact potential difference measurements, and consequently, obtain values of work function for samples at high temperatures, including relevant operating temperatures for thermionic emitters (>1000 °C).

KW - Cathode

KW - Kelvin probe

KW - M-type cathode

KW - Thermionic emission

KW - Vacuum electron device

UR - http://www.scopus.com/inward/record.url?scp=85161935687&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85161935687&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2023.112169

DO - 10.1016/j.vacuum.2023.112169

M3 - Article

AN - SCOPUS:85161935687

SN - 0042-207X

VL - 215

JO - Vacuum

JF - Vacuum

M1 - 112169

ER -

High-temperature contact potential difference measurement of surface work function using in vacuo Kelvin probe

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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