Limiting regimes for electron-beam induced deposition of copper from aqueous solutions containing surfactants

Samaneh Esfandiarpour; J. Todd Hastings

doi:10.1088/1361-6528/abd8f5

Limiting regimes for electron-beam induced deposition of copper from aqueous solutions containing surfactants

Samaneh Esfandiarpour
, J. Todd Hastings

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Focused electron beam induced deposition of pure materials from aqueous solutions has been of interest in recent years. However, controlling the liquid film in partial vacuum is challenging. Here we modify the substrate to increase control over the liquid layer in order to conduct a parametric study of copper deposition in an environmental scanning electron microscope. We identified the transition from electron to mass-transport limited deposition as well as two additional regimes characterized by aggregated and high-aspect ratio deposits. We observe a high deposition efficiency of 1-10 copper atoms per primary electron that is consistent with a radiation chemical model of the deposition process.

Original language	English
Article number	155302
Journal	Nanotechnology
Volume	32
Issue number	15
DOIs	https://doi.org/10.1088/1361-6528/abd8f5
State	Published - Jan 25 2021

Bibliographical note

Publisher Copyright:
© 2021 IOP Publishing Ltd.

Funding

This material is based upon work supported by the National Science Foundation under Grant No. CMMI-1538650. This work was performed in part at the University of Kentucky Center for Nanoscale Science and Engineering, the University of Kentucky Electron Microscopy Center, and the University of Louisville Micro and Nano Technology Center, members of the National Nanotechnology Coordinated Infrastructure (NNCI), which is supported by the National Science Foundation (ECCS-2025075). This work used equipment supported by National Science Foundation Grant No. CMMI-1125998.

Funders	Funder number
Micro/Nano Technology Center at University of Louisville
University of Kentucky
Collaborative Innovation Center of Suzhou Nano Science and Technology	CMMI-1125998, ECCS-2025075
National Science Foundation Arctic Social Science Program	CMMI-1538650, 1125998

Keywords

Copper deposition
Direct write nanofabrication
Electron beam induced process
FEBID
Limiting regimes for copper deposition
Liquid phase

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

Access to Document

10.1088/1361-6528/abd8f5

Cite this

@article{d11a2f76de0645d1b75b5c706b27c647,

title = "Limiting regimes for electron-beam induced deposition of copper from aqueous solutions containing surfactants",

abstract = "Focused electron beam induced deposition of pure materials from aqueous solutions has been of interest in recent years. However, controlling the liquid film in partial vacuum is challenging. Here we modify the substrate to increase control over the liquid layer in order to conduct a parametric study of copper deposition in an environmental scanning electron microscope. We identified the transition from electron to mass-transport limited deposition as well as two additional regimes characterized by aggregated and high-aspect ratio deposits. We observe a high deposition efficiency of 1-10 copper atoms per primary electron that is consistent with a radiation chemical model of the deposition process.",

keywords = "Copper deposition, Direct write nanofabrication, Electron beam induced process, FEBID, Limiting regimes for copper deposition, Liquid phase",

author = "Samaneh Esfandiarpour and Hastings, \{J. Todd\}",

note = "Publisher Copyright: {\textcopyright} 2021 IOP Publishing Ltd.",

year = "2021",

month = jan,

day = "25",

doi = "10.1088/1361-6528/abd8f5",

language = "English",

volume = "32",

number = "15",

}

TY - JOUR

T1 - Limiting regimes for electron-beam induced deposition of copper from aqueous solutions containing surfactants

AU - Esfandiarpour, Samaneh

AU - Hastings, J. Todd

PY - 2021/1/25

Y1 - 2021/1/25

N2 - Focused electron beam induced deposition of pure materials from aqueous solutions has been of interest in recent years. However, controlling the liquid film in partial vacuum is challenging. Here we modify the substrate to increase control over the liquid layer in order to conduct a parametric study of copper deposition in an environmental scanning electron microscope. We identified the transition from electron to mass-transport limited deposition as well as two additional regimes characterized by aggregated and high-aspect ratio deposits. We observe a high deposition efficiency of 1-10 copper atoms per primary electron that is consistent with a radiation chemical model of the deposition process.

AB - Focused electron beam induced deposition of pure materials from aqueous solutions has been of interest in recent years. However, controlling the liquid film in partial vacuum is challenging. Here we modify the substrate to increase control over the liquid layer in order to conduct a parametric study of copper deposition in an environmental scanning electron microscope. We identified the transition from electron to mass-transport limited deposition as well as two additional regimes characterized by aggregated and high-aspect ratio deposits. We observe a high deposition efficiency of 1-10 copper atoms per primary electron that is consistent with a radiation chemical model of the deposition process.

KW - Copper deposition

KW - Direct write nanofabrication

KW - Electron beam induced process

KW - FEBID

KW - Limiting regimes for copper deposition

KW - Liquid phase

UR - https://www.scopus.com/pages/publications/85101448261

UR - https://www.scopus.com/pages/publications/85101448261#tab=citedBy

U2 - 10.1088/1361-6528/abd8f5

DO - 10.1088/1361-6528/abd8f5

M3 - Article

C2 - 33406512

AN - SCOPUS:85101448261

SN - 0957-4484

VL - 32

JO - Nanotechnology

JF - Nanotechnology

IS - 15

M1 - 155302

ER -

Limiting regimes for electron-beam induced deposition of copper from aqueous solutions containing surfactants

Abstract

Bibliographical note

Funding

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this