Micro-scratch study of a magnetron-sputtered Zr-based metallic-glass film

F. X. Liu, F. Q. Yang, Y. F. Gao, W. H. Jiang, Y. F. Guan, P. D. Rack, O. Sergic, P. K. Liaw

Research output: Contribution to journalArticlepeer-review

65 Scopus citations


Using the micro-scratch technique, the tribological behavior of ZrCuAlNi metallic-glass films on 316L stainless steel was studied. With the application of ramping load, the critical load of about 110 mN was determined, at which the coefficient of friction increased sharply and the indenter penetration depth reached the film thickness. No clear evidence of film debonding was found, which, together with the observation of multiple shear bands, indicated good adhesion and ductility of the metallic-glass film. When subjected to constant loads, the coefficient of friction increased rapidly once the critical load was passed. The scratch results and the scanning-electron microscopy observations demonstrated good adhesion between the film and the substrate, which may be due to the good interfacial bonding and low residual stress in the film.

Original languageEnglish
Pages (from-to)3480-3484
Number of pages5
JournalSurface and Coatings Technology
Issue number22
StatePublished - Aug 15 2009

Bibliographical note

Funding Information:
The authors are grateful to the National Science Foundation (NSF) Combined Research and Curriculum Development (CRCD) Program. Discussions with Professor M.W. Chen of Tohoku University and Professor J. P. Chu of National Taiwan University of Science and Technology are greatly appreciated. Research at Oak Ridge National Laboratory is sponsored by the Division of Materials Sciences and Engineering, Office of Basic Energy Sciences, U.S. Department of Energy, under contract DE-AC05-00OR22725 with UT Battelle, LLC. Dr. M. W. Chen of the Tohoku University in Japan is appreciated for the TEM study.


  • Adhesion
  • Coefficient of friction
  • Critical load
  • Metallic-glass film
  • Scratch

ASJC Scopus subject areas

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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