Microstructural influence of OsRu thin films on dispenser cathodes

Phillip Swartzentruber, T. John Balk, Scott Roberts, Michael Effgen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

Osmium-Ruthenium films were subjected to 1000 hours of close-spaced diode (CSD) testing and the film microstructures were evaluated in light of the CSD test results in order to generate improved film architectures for further CSD testing. Low knee temperatures correlated with a {10-10}/{10-11} film texture of annealed films.

Original languageEnglish
Title of host publication2012 IEEE 13th International Vacuum Electronics Conference, IVEC 2012
Pages163-164
Number of pages2
DOIs
StatePublished - 2012
Event2012 IEEE 13th International Vacuum Electronics Conference, IVEC 2012 - Monterey, CA, United States
Duration: Apr 24 2012Apr 26 2012

Publication series

Name2012 IEEE 13th International Vacuum Electronics Conference, IVEC 2012

Conference

Conference2012 IEEE 13th International Vacuum Electronics Conference, IVEC 2012
Country/TerritoryUnited States
CityMonterey, CA
Period4/24/124/26/12

Keywords

  • M-coating
  • M-type
  • dispenser cathode
  • microstructure
  • osmium
  • ruthenium
  • thin film

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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