Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking

J. T. Hastings, Feng Zhang, Henry I. Smith

Research output: Contribution to journalArticlepeer-review

40 Scopus citations
Original languageEnglish
Pages (from-to)2650-2656
Number of pages7
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number6
DOIs
StatePublished - 2003

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking'. Together they form a unique fingerprint.

Cite this