Near-infrared optical absorption enhanced in black silicon via Ag nanoparticle-induced localized surface plasmon

Peng Zhang, Shibin Li, Chunhua Liu, Xiongbang Wei, Zhiming Wu, Yadong Jiang, Zhi Chen

Research output: Contribution to journalArticlepeer-review

35 Scopus citations

Abstract

Abstract: Due to the localized surface plasmon (LSP) effect induced by Ag nanoparticles inside black silicon, the optical absorption of black silicon is enhanced dramatically in near-infrared range (1,100 to 2,500 nm). The black silicon with Ag nanoparticles shows much higher absorption than black silicon fabricated by chemical etching or reactive ion etching over ultraviolet to near-infrared (UV-VIS-NIR, 250 to 2,500 nm). The maximum absorption even increased up to 93.6% in the NIR range (820 to 2,500 nm). The high absorption in NIR range makes LSP-enhanced black silicon a potential material used for NIR-sensitive optoelectronic device.

PACS: 78.67.Bf; 78.30.Fs; 78.40.-q; 42.70.Gi.

Original languageEnglish
Article number519
JournalNanoscale Research Letters
Volume9
Issue number1
DOIs
StatePublished - 2014

Bibliographical note

Publisher Copyright:
© 2014, Zhang et al.; licensee Springer.

Keywords

  • Absorption
  • Ag nanoparticles
  • Black silicon
  • Chemical etching
  • LSP

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics

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