Abstract: Due to the localized surface plasmon (LSP) effect induced by Ag nanoparticles inside black silicon, the optical absorption of black silicon is enhanced dramatically in near-infrared range (1,100 to 2,500 nm). The black silicon with Ag nanoparticles shows much higher absorption than black silicon fabricated by chemical etching or reactive ion etching over ultraviolet to near-infrared (UV-VIS-NIR, 250 to 2,500 nm). The maximum absorption even increased up to 93.6% in the NIR range (820 to 2,500 nm). The high absorption in NIR range makes LSP-enhanced black silicon a potential material used for NIR-sensitive optoelectronic device.
PACS: 78.67.Bf; 78.30.Fs; 78.40.-q; 42.70.Gi.
|Journal||Nanoscale Research Letters|
|State||Published - 2014|
Bibliographical noteFunding Information:
This work was partially supported by the National Science Foundation of China via Grant Nos. 61204098, 61371046, 61421002, and 61101030, the National Higher Education Institution General Research and Development Funding under Grant No ZYGX2013J063, and the China Postdoctoral Science Foundation under Grant No. 2014 M552330.
© 2014, Zhang et al.; licensee Springer.
- Ag nanoparticles
- Black silicon
- Chemical etching
ASJC Scopus subject areas
- Materials Science (all)
- Condensed Matter Physics