Near-infrared optical absorption enhanced in black silicon via Ag nanoparticle-induced localized surface plasmon

Peng Zhang; Shibin Li; Chunhua Liu; Xiongbang Wei; Zhiming Wu; Yadong Jiang; Zhi Chen

doi:10.1186/1556-276X-9-519

Near-infrared optical absorption enhanced in black silicon via Ag nanoparticle-induced localized surface plasmon

Peng Zhang, Shibin Li, Chunhua Liu, Xiongbang Wei, Zhiming Wu, Yadong Jiang, Zhi Chen

Research output: Contribution to journal › Article › peer-review

37 Scopus citations

Abstract

Abstract: Due to the localized surface plasmon (LSP) effect induced by Ag nanoparticles inside black silicon, the optical absorption of black silicon is enhanced dramatically in near-infrared range (1,100 to 2,500 nm). The black silicon with Ag nanoparticles shows much higher absorption than black silicon fabricated by chemical etching or reactive ion etching over ultraviolet to near-infrared (UV-VIS-NIR, 250 to 2,500 nm). The maximum absorption even increased up to 93.6% in the NIR range (820 to 2,500 nm). The high absorption in NIR range makes LSP-enhanced black silicon a potential material used for NIR-sensitive optoelectronic device.

PACS: 78.67.Bf; 78.30.Fs; 78.40.-q; 42.70.Gi.

Original language	English
Article number	519
Journal	Nanoscale Research Letters
Volume	9
Issue number	1
DOIs	https://doi.org/10.1186/1556-276X-9-519
State	Published - 2014

Bibliographical note

Publisher Copyright:
© 2014, Zhang et al.; licensee Springer.

Keywords

Absorption
Ag nanoparticles
Black silicon
Chemical etching
LSP

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics

Access to Document

10.1186/1556-276X-9-519

Cite this

@article{5ce2a57f7a4e43859feaf732b70727cc,

title = "Near-infrared optical absorption enhanced in black silicon via Ag nanoparticle-induced localized surface plasmon",

abstract = "Abstract: Due to the localized surface plasmon (LSP) effect induced by Ag nanoparticles inside black silicon, the optical absorption of black silicon is enhanced dramatically in near-infrared range (1,100 to 2,500 nm). The black silicon with Ag nanoparticles shows much higher absorption than black silicon fabricated by chemical etching or reactive ion etching over ultraviolet to near-infrared (UV-VIS-NIR, 250 to 2,500 nm). The maximum absorption even increased up to 93.6% in the NIR range (820 to 2,500 nm). The high absorption in NIR range makes LSP-enhanced black silicon a potential material used for NIR-sensitive optoelectronic device.PACS: 78.67.Bf; 78.30.Fs; 78.40.-q; 42.70.Gi.",

keywords = "Absorption, Ag nanoparticles, Black silicon, Chemical etching, LSP",

author = "Peng Zhang and Shibin Li and Chunhua Liu and Xiongbang Wei and Zhiming Wu and Yadong Jiang and Zhi Chen",

note = "Publisher Copyright: {\textcopyright} 2014, Zhang et al.; licensee Springer.",

year = "2014",

doi = "10.1186/1556-276X-9-519",

language = "English",

volume = "9",

number = "1",

}

TY - JOUR

T1 - Near-infrared optical absorption enhanced in black silicon via Ag nanoparticle-induced localized surface plasmon

AU - Zhang, Peng

AU - Li, Shibin

AU - Liu, Chunhua

AU - Wei, Xiongbang

AU - Wu, Zhiming

AU - Jiang, Yadong

AU - Chen, Zhi

PY - 2014

Y1 - 2014

N2 - Abstract: Due to the localized surface plasmon (LSP) effect induced by Ag nanoparticles inside black silicon, the optical absorption of black silicon is enhanced dramatically in near-infrared range (1,100 to 2,500 nm). The black silicon with Ag nanoparticles shows much higher absorption than black silicon fabricated by chemical etching or reactive ion etching over ultraviolet to near-infrared (UV-VIS-NIR, 250 to 2,500 nm). The maximum absorption even increased up to 93.6% in the NIR range (820 to 2,500 nm). The high absorption in NIR range makes LSP-enhanced black silicon a potential material used for NIR-sensitive optoelectronic device.PACS: 78.67.Bf; 78.30.Fs; 78.40.-q; 42.70.Gi.

AB - Abstract: Due to the localized surface plasmon (LSP) effect induced by Ag nanoparticles inside black silicon, the optical absorption of black silicon is enhanced dramatically in near-infrared range (1,100 to 2,500 nm). The black silicon with Ag nanoparticles shows much higher absorption than black silicon fabricated by chemical etching or reactive ion etching over ultraviolet to near-infrared (UV-VIS-NIR, 250 to 2,500 nm). The maximum absorption even increased up to 93.6% in the NIR range (820 to 2,500 nm). The high absorption in NIR range makes LSP-enhanced black silicon a potential material used for NIR-sensitive optoelectronic device.PACS: 78.67.Bf; 78.30.Fs; 78.40.-q; 42.70.Gi.

KW - Absorption

KW - Ag nanoparticles

KW - Black silicon

KW - Chemical etching

KW - LSP

UR - http://www.scopus.com/inward/record.url?scp=84919934592&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84919934592&partnerID=8YFLogxK

U2 - 10.1186/1556-276X-9-519

DO - 10.1186/1556-276X-9-519

M3 - Article

AN - SCOPUS:84919934592

SN - 1931-7573

VL - 9

JO - Nanoscale Research Letters

JF - Nanoscale Research Letters

IS - 1

M1 - 519

ER -

Near-infrared optical absorption enhanced in black silicon via Ag nanoparticle-induced localized surface plasmon

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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