Optical waveguides with apodized sidewall gratings via spatial-phase-locked electron-beam lithography

J. T. Hastings, Michael H. Lim, J. G. Goodberlet, Henry I. Smith

Research output: Contribution to journalArticlepeer-review

74 Scopus citations

Abstract

Grating-based devices were fabricated in a single lithography step by placing Bragg gratings in the sidewalls of integrated waveguides. In particular, apodized sidewall gratings were fabricated in silicon-on- insulator rib waveguides with grating strengths and apodization profiles suitable for WDM channel add/drop filters.

Original languageEnglish
Pages (from-to)2753-2757
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number6
DOIs
StatePublished - Nov 2002

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Optical waveguides with apodized sidewall gratings via spatial-phase-locked electron-beam lithography'. Together they form a unique fingerprint.

Cite this