Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths

P. Lv, G. F. Cao, L. J. Wen, S. A. Kharusi, G. Anton, I. J. Arnquist, I. Badhrees, P. S. Barbeau, D. Beck, V. Belov, T. Bhatta, P. A. Breur, J. P. Brodsky, E. Brown, T. Brunner, S. Byrne Mamahit, E. Caden, L. Cao, C. Chambers, B. ChanaS. A. Charlebois, M. Chiu, B. Cleveland, M. Coon, A. Craycraft, J. Dalmasson, T. Daniels, L. Darroch, A. De St. Croix, A. Der Mesrobian-Kabakian, K. Deslandes, R. Devoe, M. L.DI Vacri, J. DIlling, Y. Y. DIng, M. J. Dolinski, L. Doria, A. Dragone, J. Echevers, F. Edaltafar, M. Elbeltagi, L. Fabris, D. Fairbank, W. Fairbank, J. Farine, S. Ferrara, S. Feyzbakhsh, A. Fucarino, G. Gallina, P. Gautam, G. Giacomini, D. Goeldi, R. Gornea, G. Gratta, E. V. Hansen, M. Heffner, E. W. Hoppe, J. Hobl, A. House, M. Hughes, A. Iverson, A. Jamil, M. J. Jewell, X. S. Jiang, A. Karelin, L. J. Kaufman, T. Koffas, R. Krucken, A. Kuchenkov, K. S. Kumar, Y. Lan, A. Larson, K. G. Leach, B. G. Lenardo, D. S. Leonard, G. Li, S. Li, Z. Li, C. Licciardi, R. MacLellan, N. Massacret, T. McElroy, M. Medina-Peregrina, T. Michel, B. Mong, D. C. Moore, K. Murray, P. Nakarmi, C. R. Natzke, R. J. Newby, Z. Ning, O. Njoya, F. Nolet, O. Nusair, K. Odgers, A. Odian, M. Oriunno, J. L. Orrell, G. S. Ortega, I. Ostrovskiy, C. T. Overman, S. Parent, A. Piepke, A. Pocar, J. F. Pratte, V. Radeka, E. Raguzin, S. Rescia, F. Retiere, M. Richman, A. Robinson, T. Rossignol, P. C. Rowson, N. Roy, J. Runge, R. Saldanha, S. Sangiorgio, K. Skarpaas, A. K. Soma, G. St-Hilaire, V. Stekhanov, T. Stiegler, X. L. Sun, M. Tarka, J. Todd, T. I. Totev, R. Tsang, T. Tsang, F. Vachon, V. Veeraraghavan, S. Viel, G. Visser, C. Vivo-Vilches, J. L. Vuilleumier, M. Wagenpfeil, T. Wager, M. Walent, Q. Wang, J. Watkins, W. Wei, U. Wichoski, S. X. Wu, W. H. Wu, X. Wu, Q. Xia, H. Yang, L. Yang, O. Zeldovich, J. Zhao, Y. Zhou, T. Ziegler

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Characterization of the vacuum ultraviolet (VUV) reflectance of silicon photomultipliers (SiPMs) is important for large-scale SiPM-based photodetector systems. We report the angular dependence of the specular reflectance in vacuum of SiPMs manufactured by Fondazionc Bruno Kessler (FBK) and Hamamatsu Photonics K.K. (HPK) over wavelengths ranging from 120 to 280 nm. Refractive index and extinction coefficient of the thin silicon-dioxide film deposited on the surface of the FBK SiPMs are derived from reflectance data of an FBK silicon wafer with the same deposited oxide film as SiPMs. The diffuse reflectance of SiPMs is also measured at 193 nm. We use the VUV spectral dependence of the optical constants to predict the reflectance of the FBK silicon wafer and FBK SiPMs in liquid xenon.

Original languageEnglish
Article number9246577
Pages (from-to)2501-2510
Number of pages10
JournalIEEE Transactions on Nuclear Science
Volume67
Issue number12
DOIs
StatePublished - Dec 2020

Bibliographical note

Publisher Copyright:
© 1963-2012 IEEE.

Keywords

  • Diffuse reflectance
  • photon detection efficiency (PDE)
  • silicon photomultiplier (SiPM)
  • specular reflectance
  • vacuum ultraviolet (VUV)

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Electrical and Electronic Engineering

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