This article presents a new direct patterning technique in which laser photoreduction of silver from a liquid is controlled by a scanning atomic force microscope tip. Contrary to expectations, the tip suppresses, rather than enhances, deposition on the underlying substrate, and this suppression persists in the absence of the tip. Experiments presented here exclude three potential mechanisms: purely mechanical material removal, depletion of the silver precursor, and preferential photoreduction on existing deposits. These results represent a first step toward direct, negative tone, tip-based patterning of functional materials.
|Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
|Published - Nov 2012
Bibliographical noteFunding Information:
The authors thank Greg Schardein for taking the EDS spectra and Gazi M. Huda for his valuable comments and suggestions. Experiments described here were conducted in part in the Center for Nanoscale Science and Engineering (infrastructure established under NSF Grant No. EPS-0447479) and Electron Microscopy Center at the University of Kentucky. This work was supported by the National Science Foundation under Grant No. CMMI-0800658.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Process Chemistry and Technology
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry