Stability and dynamics of frenkel pairs in Si

M. J. Beck, L. Tsetseris, S. T. Pantelides

Research output: Contribution to journalArticlepeer-review

10 Scopus citations


Extensive experiments and calculation have shown that interstitials in p-Si diffuse athermally, leading to the conclusion that vacancy-interstitial pairs, or Frenkel pairs (FPs), either rapidly recombine or dissociate, even at cryogenic temperatures. More recent experiments, however, suggest that FPs persist to 150 K. Here we report first-principles calculations of FP properties and resolve the apparent conflict between experiments by showing that athermal interstitial diffusion is suppressed in proximal FPs due to vacancy-interstitial interactions.

Original languageEnglish
Article number215503
JournalPhysical Review Letters
Issue number21
StatePublished - Nov 20 2007

ASJC Scopus subject areas

  • General Physics and Astronomy


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