Substrate effects on the electron-beam-induced deposition of platinum from a liquid precursor

Eugenii U. Donev, Gregory Schardein, John C. Wright, J. Todd Hastings

Research output: Contribution to journalArticlepeer-review

32 Scopus citations


Focused electron-beam-induced deposition using bulk liquid precursors (LP-EBID) is a new nanofabrication technique developed in the last two years as an alternative to conventional EBID, which utilizes cumbersome gaseous precursors. Furthermore, LP-EBID using dilute aqueous precursors has been demonstrated to yield platinum (Pt) nanostructures with as-deposited metal content that is substantially higher than the purity achieved by EBID with currently available gaseous precursors. This advantage of LP-EBID - along with the ease of use, low cost, and relative innocuousness of the liquid precursors - holds promise for its practical applicability in areas such as rapid device prototyping and lithographic mask repair. One of the feasibility benchmarks for the LP-EBID method is the ability to deposit high-fidelity nanostructures on various substrate materials. In this study, we report the first observations of performing LP-EBID on bare and metal-coated silicon-nitride membranes, and compare the resulting Pt deposits to those obtained by LP-EBID on polyimide membranes in terms of nucleation, morphology, size dependence on electron dose, and purity.

Original languageEnglish
Pages (from-to)2709-2717
Number of pages9
Issue number7
StatePublished - Jul 2011

ASJC Scopus subject areas

  • General Materials Science


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