Wetting kinetics of a hypo-eutectic Al-Si system

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This study is devoted to investigation of spreading of a hypo-eutectic Al 8Si system over a flat Al surface. Wetting kinetics was studied using a real time in situ monitoring of the triple line movement facilitated by a hot-stage microscopy system under controlled atmosphere. Analysis of the validity of the classic Tanner's law correlation developed for inert wetting systems is performed. A good agreement of the power relationship between the triple line location and time was established. The dispersion of the n-power exponent magnitude is between 9 and 13, with an average value of 11.

Original languageEnglish
Pages (from-to)2241-2244
Number of pages4
JournalMaterials Letters
Issue number15
StatePublished - May 31 2008

Bibliographical note

Funding Information:
This work was supported in part by the Kentucky Science and Engineering Foundation through grant KSEF-829-RDE-007 and National Science Foundation through grant DMI-9908319.


  • Aluminum
  • Brazing
  • Wetting

ASJC Scopus subject areas

  • Materials Science (all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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