REU: BRITE Synergy: Transforming Electron Beam Lithography with Reactive Gases

The purpose of this supplemental funding request is to support undergraduate research for an electrical engineering major in the areas of semiconductor device fabrication and nanomanufacturing. The student will receive training in how to plan, conduct, document, and communicate scientific and engineering research. The student will participate in the investigation of the effect of reactive gases on electron beam lithography, a key technology for integrated circuit mask production and direct-write prototyping of nano- electronic and photonic devices. This effort twill include specific training in electron- beam lithography and a variety of materials characterization techniques.