Accurate frequency alignment in fabrication of high-order microring-resonator filters

Sun Jie; Charles W. Holzwarth; Marcus Dahlem; Jeffrey T. Hastings; Henry I. Smith

doi:10.1364/OE.16.015958

Accurate frequency alignment in fabrication of high-order microring-resonator filters

Sun Jie
, Charles W. Holzwarth
, Marcus Dahlem
, Jeffrey T. Hastings
, Henry I. Smith

Producción científica: Article › revisión exhaustiva

5 Citas (Scopus)

Resumen

Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.

Idioma original	English
Páginas (desde-hasta)	15958-15963
Número de páginas	6
Publicación	Optics Express
Volumen	16
N.º	20
DOI	https://doi.org/10.1364/OE.16.015958
Estado	Published - sept 29 2008

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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abstract = "Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.",

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AU - Jie, Sun

AU - Holzwarth, Charles W.

AU - Dahlem, Marcus

AU - Hastings, Jeffrey T.

AU - Smith, Henry I.

PY - 2008/9/29

Y1 - 2008/9/29

N2 - Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.

AB - Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.

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UR - https://www.scopus.com/pages/publications/54749087136#tab=citedBy

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Accurate frequency alignment in fabrication of high-order microring-resonator filters

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