Crystallographic etching of few-layer graphene

Sujit S. Datta; Douglas R. Strachan; Samuel M. Khamis; A. T.Charlie Johnson

doi:10.1021/nl080583r

Crystallographic etching of few-layer graphene

Sujit S. Datta
, Douglas R. Strachan
, Samuel M. Khamis
, A. T.Charlie Johnson

Physics And Astronomy

Producción científica: Article › revisión exhaustiva

528 Citas (Scopus)

Resumen

We demonstrate a method by which few-layer graphene samples can be etched along crystallographic axes by thermally activated metallic nanoparticles. The technique results in long (>1 μm) crystallographic edges etched through to the insulating substrate, making the process potentially useful for atomically precise graphene device fabrication. This advance could enable atomically precise construction of integrated circuits from single graphene sheets with a wide range of technological applications.

Idioma original	English
Páginas (desde-hasta)	1912-1915
Número de páginas	4
Publicación	Nano Letters
Volumen	8
N.º	7
DOI	https://doi.org/10.1021/nl080583r
Estado	Published - jul 2008

Financiación

Financiadores	Número del financiador
U.S. Department of Energy Chinese Academy of Sciences Guangzhou Municipal Science and Technology Project Oak Ridge National Laboratory Extreme Science and Engineering Discovery Environment National Science Foundation National Energy Research Scientific Computing Center National Natural Science Foundation of China	0425780

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl080583r

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abstract = "We demonstrate a method by which few-layer graphene samples can be etched along crystallographic axes by thermally activated metallic nanoparticles. The technique results in long (>1 μm) crystallographic edges etched through to the insulating substrate, making the process potentially useful for atomically precise graphene device fabrication. This advance could enable atomically precise construction of integrated circuits from single graphene sheets with a wide range of technological applications.",

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AU - Strachan, Douglas R.

AU - Khamis, Samuel M.

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AB - We demonstrate a method by which few-layer graphene samples can be etched along crystallographic axes by thermally activated metallic nanoparticles. The technique results in long (>1 μm) crystallographic edges etched through to the insulating substrate, making the process potentially useful for atomically precise graphene device fabrication. This advance could enable atomically precise construction of integrated circuits from single graphene sheets with a wide range of technological applications.

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UR - https://www.scopus.com/pages/publications/52349104886#tab=citedBy

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JO - Nano Letters

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Crystallographic etching of few-layer graphene

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ASJC Scopus subject areas

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