TY - GEN
T1 - Cylindrical lens design with illuminance uniformity in the image plane of critical illumination system
AU - Huang, Chong
AU - Chen, Haiqing
AU - Zhang, Kun
AU - Zhao, Shuang
PY - 2010
Y1 - 2010
N2 - In object simulation equipment, field diaphragm is critical illuminated to obtain the maximum possible light energy. When light source is a tiny surface source, and beam is shaped with parabolic reflect mirror to parallelism. We design the cylindrical lens to reshape the parallel beam to elliptic image spot of 25.4mmx3mm, and imaging in the field diaphragm of simulation system. For the volume restriction, we design a refractive system employed by one piece of meniscus lens and two pieces of cylindrical lens. In x direction, the linear field of image is 25.4mm, and we bring in a certain amount of sphere aberration in order to make light energy uniform distribution in the direction. Meanwhile, in y direction, the image height accords to the requirement by controlling focus distance. Illuminance of marginal field of x direction reaches 95% of that of centre field, which satisfies the system requirement. The configuration of this lens is rather concise and hardly has any problem in processing.
AB - In object simulation equipment, field diaphragm is critical illuminated to obtain the maximum possible light energy. When light source is a tiny surface source, and beam is shaped with parabolic reflect mirror to parallelism. We design the cylindrical lens to reshape the parallel beam to elliptic image spot of 25.4mmx3mm, and imaging in the field diaphragm of simulation system. For the volume restriction, we design a refractive system employed by one piece of meniscus lens and two pieces of cylindrical lens. In x direction, the linear field of image is 25.4mm, and we bring in a certain amount of sphere aberration in order to make light energy uniform distribution in the direction. Meanwhile, in y direction, the image height accords to the requirement by controlling focus distance. Illuminance of marginal field of x direction reaches 95% of that of centre field, which satisfies the system requirement. The configuration of this lens is rather concise and hardly has any problem in processing.
KW - back focus length
KW - critical illumination
KW - cylindrical lens
KW - optical design
UR - https://www.scopus.com/pages/publications/78650030481
UR - https://www.scopus.com/pages/publications/78650030481#tab=citedBy
U2 - 10.1117/12.866831
DO - 10.1117/12.866831
M3 - Conference contribution
AN - SCOPUS:78650030481
SN - 9780819480859
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies
T2 - 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Y2 - 26 April 2010 through 29 April 2010
ER -