@inproceedings{444ef0801501470b8309ead71faa1fa1,
title = "Effects of annealing on microstructure of osmium-ruthenium thin films",
abstract = "Osmium-ruthenium (OsRu) thin films of different thickness were deposited on porous tungsten (W) pellets in a configuration similar to dispenser cathodes, using two separate sputtering systems. In order to assess which films may best inhibit interdiffusion between the OsRu film and the W substrate during annealing, the grain structure and texture of OsRu films were characterized by x-ray diffraction and scanning electron microscopy.",
keywords = "Microstructure, Osmium, Ruthenium, Thin film",
author = "Li, \{W. C.\} and S. Roberts and Balk, \{T. J.\}",
year = "2009",
doi = "10.1109/IVELEC.2009.5193510",
language = "English",
isbn = "9781424434992",
series = "2009 IEEE International Vacuum Electronics Conference, IVEC 2009",
pages = "177--178",
booktitle = "2009 IEEE International Vacuum Electronics Conference, IVEC 2009",
note = "2009 IEEE International Vacuum Electronics Conference, IVEC 2009 ; Conference date: 28-04-2009 Through 30-04-2009",
}