Improvement of hot carrier reliability with deuterium anneals for manufacturing multilevel metal/dielectric MOS systems
- I. C. Kizilyalli
- , G. C. Abeln
- , Z. Chen
- , J. Lee
- , G. Weber
- , B. Kotzias
- , S. Chetlur
- , J. W. Lyding
- , K. Hess
Producción científica: Article › revisión exhaustiva
25
Citas
(Scopus)