Resumen
An elastic model is developed to estimate the interfacial strength between a submicron surface coating and a compliant substrate. The analysis uses a shear-lag model and assumes the plane-stress state in the surface coating. The critical indentation load for the indentation-induced delamination of the coating from the substrate increases with the third power of the indentation depth and is a linear function of the reciprocal of the coating thickness. The indentation-induced delamination of SR399 ultrathin surface coatings over acrylic substrate has been evaluated, using the nanonindentation technique for coating thicknesses of 47, 125, 220 and 3000 nm. For the submicron coatings, the dependence of the critical indentation load on the coating thickness supports the elastic model. The interfacial strength is found to be 46.9 MPa. In contrast, the polymeric coating of 3000 nm displays multiple "excursions" in the loading curve, and the critical indentation load is a linear function of the indentation depth.
| Idioma original | English |
|---|---|
| Páginas (desde-hasta) | 841-848 |
| Número de páginas | 8 |
| Publicación | Polymer |
| Volumen | 48 |
| N.º | 3 |
| DOI | |
| Estado | Published - ene 26 2007 |
Nota bibliográfica
Funding Information:FY is grateful for support from NSF grant CMS-0508989 and from General Motors Corporation. KG and EG are grateful for support from Optical Dynamic Corporation.
Financiación
FY is grateful for support from NSF grant CMS-0508989 and from General Motors Corporation. KG and EG are grateful for support from Optical Dynamic Corporation.
| Financiadores | Número del financiador |
|---|---|
| Optical Dynamic Corporation | |
| National Science Foundation (NSF) | CMS-0508989 |
| General Motors Corporation |
ASJC Scopus subject areas
- Organic Chemistry
- Polymers and Plastics
- Materials Chemistry
Huella
Profundice en los temas de investigación de 'Nanoindentation-induced delamination of submicron polymeric coatings'. En conjunto forman una huella única.Citar esto
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver