Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking

TY - JOUR

T1 - Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking

AU - Hastings, J. T.

AU - Zhang, Feng

AU - Smith, Henry I.

PY - 2003

Y1 - 2003

UR - https://www.scopus.com/pages/publications/0942278362

UR - https://www.scopus.com/pages/publications/0942278362#tab=citedBy

U2 - 10.1116/1.1622944

DO - 10.1116/1.1622944

M3 - Article

AN - SCOPUS:0942278362

SN - 1071-1023

VL - 21

SP - 2650

EP - 2656

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -